The following article appeared in J. Appl. Phys. 96, 7485 (2004) and may also be found at http://link.aip.org/link/?JAP/96/7485 .
S. Sayan, T. Emge, E. Garfunkel, Xinyuan Zhao, L. Wielunksi, R.A. Bartynski, David Vanderbilt, J.S. Suehle, S. Suzer, and M. Banaszak-Holl, Band alignment issues related to HfO$_2$/SiO$_2$/p-Si gate stacks (in PDF format).
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