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Plasma Challenges from Nanofabrication of Advanced Devices to Electrification of the Chemical Industry

Date and Time: Thursday, December 15, 2022, 12:00pm -
Location: 330W and Zoom (https://rutgers.zoom.us/j/94435281331?pwd=cXRXeWhySFJOb3ZnZGFnSFdRQkR2QT09)
 

Speaker: David B. Graves (Princeton Plasma Physics Laboratory (PPPL) and Department of Chemical and Biological Engineering, Princeton University)

Abstract: 

There are long-term and emerging challenges in plasma nanofabrication in the semiconductor industry as well as plasma used for thin film-based devices being explored for quantum materials. One key to understanding these challenges is to explicitly recognize the strongly interdisciplinary nature of the problem. Future challenges in plasma applications in semiconductor device nanofabrication are merging with the challenges of plasma-assisted nanofabrication of quantum devices in that both are increasingly demanding
near defect free processing. Plasma science, surface science, materials science and device science are all
important and the challenges are coupled.
One example of plasma for atomic scale control is atomic layer etching. Controlling surfaces exposed to plasma with atomic scale precision for etching, deposition or surface modification requires a deep understanding of plasma-surface interactions. Molecular dynamics (MD) simulations of plasma-assisted atomic layer etching (ALE) can be a powerful tool to simulate and visualize the key processes. An important first step is validation of the MD simulation protocol with systematic comparison of simulation predictions to experimental observations and measurements. In this application, the sequential exposure of a surface to a reactive component followed by rare gas ion bombardment requires careful control of each step and inclusion of all significant phenomena that can affect surfaces at the atomic scale.
One of the most potentially impactful applications of plasma technology over the next several decades is to electrify some parts of the global chemical industry in response to demands for rapidly reducing emission of global warming gases. I will address some of the challenges and opportunities for plasma technology in this set of problems, especially in a way that is appropriate for scaling demands in the chemical industry. 

Host: Vitaly Podzorov

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